001399821 000__ 01622nam\a2200457Ia\4500 001399821 001__ 1399821 001399821 003__ MiAaPQ 001399821 005__ 20220701003142.0 001399821 006__ m\\\\\o\\d\\\\\\\\ 001399821 007__ cr\cn\nnnunnun 001399821 008__ 110310s2011\\\\maua\\\\ob\\\\001\0\eng\d 001399821 020__ $$z0470625953 001399821 020__ $$z1118071743 001399821 020__ $$z9780470625958 001399821 020__ $$z9781118071731 001399821 020__ $$z9781118071748 001399821 035__ $$a(MiAaPQ)EBC700543 001399821 035__ $$a(Au-PeEL)EBL700543 001399821 035__ $$a(CaPaEBR)ebr10510605 001399821 035__ $$a(CaONFJC)MIL337459 001399821 035__ $$a(OCoLC)782860596 001399821 040__ $$aMiAaPQ$$cMiAaPQ$$dMiAaPQ 001399821 050_4 $$aQC611.6.S9$$bR456 2011 001399821 1001_ $$aReinhardt, Karen A. 001399821 24510 $$aHandbook of cleaning for semiconductor manufacturing :$$bfundamentals and applications /$$cKaren A. Reinhardt, Richard F. Reidy. 001399821 260__ $$aSalem, Mass. ;$$aScrivener ;$$aHoboken, N.J. :$$bJohn Wiley & Sons, Inc.,$$cc2011. 001399821 300__ $$a1 online resource (xxii, 590 pages ) :$$billustrations 001399821 336__ $$atext$$2rdacontent 001399821 337__ $$acomputer$$2rdamedia 001399821 338__ $$aonline resource$$2rdacarrier 001399821 504__ $$aIncludes bibliographical references and index. 001399821 506__ $$aAccess limited to authorized users. 001399821 650_0 $$aSemiconductors$$xSurfaces$$xCleaning. 001399821 650_0 $$aSurface preparation. 001399821 655_0 $$aElectronic books 001399821 7001_ $$aReidy, Richard F.,$$d1960- 001399821 852__ $$bebk 001399821 85640 $$3ProQuest Ebook Central Academic Complete $$uhttps://univsouthin.idm.oclc.org/login?url=https://ebookcentral.proquest.com/lib/usiricelib-ebooks/detail.action?docID=700543$$zOnline Access 001399821 909CO $$ooai:library.usi.edu:1399821$$pGLOBAL_SET 001399821 980__ $$aBIB 001399821 980__ $$aEBOOK 001399821 982__ $$aEbook 001399821 983__ $$aOnline