Pattern Recognition : ICPR International Workshops and Challenges, virtual event, January 10-15, 2021, proceedings. Part III / Alberto Del Bimbo, Rita Cucchiara, Stan Sclaroff, Giovanni Maria Farinella, Tao Mei, Marco Bertini, Hugo Jair Escalante, Roberto Vezzani (eds.).
2021
TA1634
Linked e-resources
Linked Resource
Online Access
Concurrent users
Unlimited
Authorized users
Authorized users
Document Delivery Supplied
Can lend chapters, not whole ebooks
Details
Title
Pattern Recognition : ICPR International Workshops and Challenges, virtual event, January 10-15, 2021, proceedings. Part III / Alberto Del Bimbo, Rita Cucchiara, Stan Sclaroff, Giovanni Maria Farinella, Tao Mei, Marco Bertini, Hugo Jair Escalante, Roberto Vezzani (eds.).
ISBN
9783030687960 (electronic book)
3030687961 (electronic book)
3030687961 (electronic book)
Published
Cham, Switzerland : Springer, [2021]
Language
English
Description
1 online resource (xxi, 767 pages) : illustrations
Other Standard Identifiers
10.1007/978-3-030-68796-0 doi
Call Number
TA1634
Dewey Decimal Classification
006.3/7
Summary
This 8-volumes set constitutes the refereed of the 25th International Conference on Pattern Recognition Workshops, ICPR 2020, held virtually in Milan, Italy and rescheduled to January 10 - 11, 2021 due to Covid-19 pandemic. The 416 full papers presented in these 8 volumes were carefully reviewed and selected from about 700 submissions. The 46 workshops cover a wide range of areas including machine learning, pattern analysis, healthcare, human behavior, environment, surveillance, forensics and biometrics, robotics and egovision, cultural heritage and document analysis, retrieval, and women at ICPR2020.
Bibliography, etc. Note
Includes bibliographical references and author index.
Access Note
Access limited to authorized users.
Digital File Characteristics
text file
PDF
Source of Description
Online resource; title from PDF title page (SpringerLink, viewed March 19, 2021).
Added Author
Del Bimbo, Alberto, editor
Cucchiara, Rita, editor
Sclaroff, Stan, editor
Farinella, Giovanni Maria, editor
Mei, Tao, editor.
Bertini, Marco, editor
Escalante, Hugo Jair, editor
Vezzani, Roberto, editor
Cucchiara, Rita, editor
Sclaroff, Stan, editor
Farinella, Giovanni Maria, editor
Mei, Tao, editor.
Bertini, Marco, editor
Escalante, Hugo Jair, editor
Vezzani, Roberto, editor
Series
Lecture notes in computer science ; 12663. 0302-9743
LNCS sublibrary. SL 6, Image processing, computer vision, pattern recognition, and graphics.
LNCS sublibrary. SL 6, Image processing, computer vision, pattern recognition, and graphics.
Available in Other Form
Print version: 9783030687953
Print version: 9783030687977
Print version: 9783030687977
Linked Resources
Online Access
Record Appears in
Online Resources > Ebooks
All Resources
All Resources
Table of Contents
EDL-AI
Explainable Deep Learning/AI
EgoApp 2020
2nd Workshop on Applications of Egocentric Vision 2020
ETTAC 2020
Workshop on Eye Tracking Techniques, Applications and Challenges
FAPER
International Workshop on Fine Art Pattern Extraction and Recognition
FBE2020
Workshop on Facial and Body Expressions, micro-expressions and behavior recognition.
Explainable Deep Learning/AI
EgoApp 2020
2nd Workshop on Applications of Egocentric Vision 2020
ETTAC 2020
Workshop on Eye Tracking Techniques, Applications and Challenges
FAPER
International Workshop on Fine Art Pattern Extraction and Recognition
FBE2020
Workshop on Facial and Body Expressions, micro-expressions and behavior recognition.