001448855 000__ 03094cam\a2200481\i\4500
001448855 001__ 1448855
001448855 003__ OCoLC
001448855 005__ 20230310004300.0
001448855 006__ m\\\\\o\\d\\\\\\\\
001448855 007__ cr\un\nnnunnun
001448855 008__ 220822s2022\\\\sz\a\\\\ob\\\\001\0\eng\d
001448855 020__ $$a9783030972776$$q(electronic bk.)
001448855 020__ $$a3030972771$$q(electronic bk.)
001448855 020__ $$z9783030972769$$q(print)
001448855 0247_ $$a10.1007/978-3-030-97277-6$$2doi
001448855 035__ $$aSP(OCoLC)1341655157
001448855 040__ $$aGW5XE$$beng$$erda$$epn$$cGW5XE$$dEBLCP$$dOCLCF$$dOCLCQ
001448855 049__ $$aISEA
001448855 050_4 $$aTA418.6
001448855 08204 $$a620.1/1228$$223/eng/20220822
001448855 1001_ $$aRauschenbach, Bernd,$$eauthor.
001448855 24510 $$aLow-energy ion irradiation of materials :$$bfundamentals and application /$$cBernd Rauschenbach.
001448855 264_1 $$aCham, Switzerland :$$bSpringer,$$c2022.
001448855 300__ $$a1 online resource (xxiv, 752 pages) :$$billustrations (some color).
001448855 336__ $$atext$$btxt$$2rdacontent
001448855 337__ $$acomputer$$bc$$2rdamedia
001448855 338__ $$aonline resource$$bcr$$2rdacarrier
001448855 4901_ $$aSpringer series in materials science,$$x2196-2812 ;$$vvolume 324
001448855 504__ $$aIncludes bibliographical references and index.
001448855 5050_ $$a1. Introduction -- 2. Collision processes -- 3. Energy-loss processes and ion range -- 4. Ion beam induced damage -- 5. Sputtering -- 6. Evolution of topography under low-energy ion bombardment -- 7. Ion beam figuring and smoothing -- 8. Ion beam deposition -- 9. Ion beam assisted deposition -- 10. Ion beam sputtering induced glancing angle deposition. .
001448855 506__ $$aAccess limited to authorized users.
001448855 520__ $$aThis book provides a comprehensive introduction to all aspects of low-energy ion-solid interaction from basic principles to advanced applications in materials science. It features a balanced and insightful approach to the fundamentals of the low-energy ion-solid surface interaction, focusing on relevant topics such as interaction potentials, kinetics of binary collisions, ion range, radiation damages, and sputtering. Additionally, the book incorporates key updates reflecting the latest relevant results of modern research on topics such as topography evolution and thin-film deposition under ion bombardment, ion beam figuring and smoothing, generation of nanostructures, and ion beam-controlled glancing angle deposition. Filling a gap of almost 20 years of relevant research activity, this book offers a wealth of information and up-to-date results for graduate students, academic researchers, and industrial scientists working in these areas.
001448855 588__ $$aOnline resource; title from PDF title page (SpringerLink, viewed August 22, 2022).
001448855 650_0 $$aMaterials$$xEffect of radiation on.
001448855 650_0 $$aLow-energy nuclear reactions.
001448855 655_0 $$aElectronic books.
001448855 830_0 $$aSpringer series in materials science ;$$vv. 324.$$x2196-2812
001448855 852__ $$bebk
001448855 85640 $$3Springer Nature$$uhttps://univsouthin.idm.oclc.org/login?url=https://link.springer.com/10.1007/978-3-030-97277-6$$zOnline Access$$91397441.1
001448855 909CO $$ooai:library.usi.edu:1448855$$pGLOBAL_SET
001448855 980__ $$aBIB
001448855 980__ $$aEBOOK
001448855 982__ $$aEbook
001448855 983__ $$aOnline
001448855 994__ $$a92$$bISE