001470047 000__ 04242cam\\22006257i\4500
001470047 001__ 1470047
001470047 003__ OCoLC
001470047 005__ 20230803003359.0
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001470047 007__ cr\cn\nnnunnun
001470047 008__ 230629s2023\\\\sz\a\\\\ob\\\\001\0\eng\d
001470047 019__ $$a1385448290
001470047 020__ $$a9783031284083$$q(electronic bk.)
001470047 020__ $$a3031284089$$q(electronic bk.)
001470047 020__ $$z9783031284076
001470047 020__ $$z3031284070
001470047 0247_ $$a10.1007/978-3-031-28408-3$$2doi
001470047 035__ $$aSP(OCoLC)1388219705
001470047 040__ $$aGW5XE$$beng$$erda$$epn$$cGW5XE$$dYDX$$dEBLCP
001470047 049__ $$aISEA
001470047 050_4 $$aQC702.7.N4
001470047 08204 $$a539.7/3$$223/eng/20230629
001470047 1001_ $$aDudnikov, Vadim,$$eauthor.
001470047 24510 $$aDevelopment and applications of negative ion sources /$$cVadim Dudnikov.
001470047 250__ $$aSecond edition.
001470047 264_1 $$aCham :$$bSpringer,$$c2023.
001470047 300__ $$a1 online resource (489 pages) :$$billustrations (black and white, and color).
001470047 336__ $$atext$$btxt$$2rdacontent
001470047 337__ $$acomputer$$bc$$2rdamedia
001470047 338__ $$aonline resource$$bcr$$2rdacarrier
001470047 4901_ $$aSpringer series on atomic, optical, and plasma physics ;$$vvolume 125
001470047 504__ $$aIncludes bibliographical references and index.
001470047 5050_ $$aChapter 1. Introduction -- Chapter 2. Charge Exchange Technologies -- Chapter 3. Methods of Negative Ion Production -- Chapter 4. Surface Plasma Production of Negative Ions -- Chapter 5. Surface Plasma Negative Ion Sources -- Chapter 6. Transport of High Brightness Negative Ion Beams -- chapter 7. Development of conversion targets for high-energy neutral beam injectors -- Chapter 8. General Remarks on Surface Plasma Sources.
001470047 506__ $$aAccess limited to authorized users.
001470047 520__ $$aThis book describes the development of sources of negative ions and their application in science and industry. It describes the physical foundations and implementation of the key methods of negative ion production and control, such as charge exchange, thermionic emission, plasma volume, secondary emission (sputtering) and surface-plasma sources, as well as the history of their development. Following on from this essential foundational material, the book goes on to explore transport of negative ion beams, and beam-plasma instabilities. Now in its second edition, the book has been substantially expanded and updated to address the many developments since it was first published, most importantly the development and investigation of cesiated surfaces with work function ~1.2-1.3 eV in conditions close to discharges in surface plasma sources. The book also includes a new chapter on development of conversion targets for high-energy neutral beam injectors, covering gas targets, plasma targets and photon targets for efficient conversion of high energy negative ion beams to neutral beams. With exposition accessible at the graduate level, and a comprehensive bibliography, this book will appeal to all students and researchers whose work concerns ion sources and their applications to accelerators, beam physics, storage rings, cyclotrons, and plasma traps.
001470047 588__ $$aDescription based on print version record.
001470047 650_0 $$aAnions.
001470047 650_0 $$aIon sources.
001470047 655_0 $$aElectronic books.
001470047 77608 $$iPrint version:$$aDudnikov, Vadim.$$tDevelopment and applications of negative ion sources.$$bSecond edition.$$dCham : Springer, 2023$$z9783031284076$$w(OCoLC)1378631789
001470047 830_0 $$aSpringer series on atomic, optical, and plasma physics ;$$vv. 125.
001470047 852__ $$bebk
001470047 85640 $$3Springer Nature$$uhttps://univsouthin.idm.oclc.org/login?url=https://link.springer.com/10.1007/978-3-031-28408-3$$zOnline Access$$91397441.1
001470047 909CO $$ooai:library.usi.edu:1470047$$pGLOBAL_SET
001470047 980__ $$aBIB
001470047 980__ $$aEBOOK
001470047 982__ $$aEbook
001470047 983__ $$aOnline
001470047 994__ $$a92$$bISE