001480905 000__ 03245cam\\22005297i\4500
001480905 001__ 1480905
001480905 003__ OCoLC
001480905 005__ 20231031003314.0
001480905 006__ m\\\\\o\\d\\\\\\\\
001480905 007__ cr\un\nnnunnun
001480905 008__ 230918s2023\\\\sz\a\\\\o\\\\\000\0\eng\d
001480905 019__ $$a1396789027$$a1397574350
001480905 020__ $$a9783031410932$$q(electronic bk.)
001480905 020__ $$a3031410939$$q(electronic bk.)
001480905 020__ $$z9783031410925
001480905 020__ $$z3031410920
001480905 0247_ $$a10.1007/978-3-031-41093-2$$2doi
001480905 035__ $$aSP(OCoLC)1398011290
001480905 040__ $$aGW5XE$$beng$$erda$$epn$$cGW5XE$$dEBLCP$$dYDX
001480905 049__ $$aISEA
001480905 050_4 $$aTA418.5
001480905 08204 $$a620.1/127$$223/eng/20230918
001480905 1001_ $$aDryzek, Jerzy,$$eauthor.
001480905 24510 $$aPositron profilometry :$$bprobing material depths for enhanced understanding /$$cJerzy Dryzek.
001480905 264_1 $$aCham :$$bSpringer,$$c2023.
001480905 300__ $$a1 online resource (vi, 143 pages) :$$billustrations (some color).
001480905 336__ $$atext$$btxt$$2rdacontent
001480905 337__ $$acomputer$$bc$$2rdamedia
001480905 338__ $$aonline resource$$bcr$$2rdacarrier
001480905 4901_ $$aSpringerBriefs in materials,$$x2192-1105
001480905 5050_ $$aIntroduction -- Positron Annihilation Techniques -- Fate of Energetic Positrons in Matter -- Positron Implantation Profile -- Positron in Inhomogeneous Matter.
001480905 506__ $$aAccess limited to authorized users.
001480905 520__ $$aThis book provides a comprehensive overview of positron profilometry, specifically focusing on the analysis of defect depth distribution in materials. Positron profilometry plays a crucial role in understanding and characterizing defects in a wide range of materials, including metals, semiconductors, polymers, and ceramics. By analyzing the depth distribution of defects, researchers can gain insights into various material properties, such as crystal structure, defect density, and diffusion behavior. The author's extensive research spanning a period of two decades has primarily centered on subsurface zones. These regions, located beneath the surface and subjected to various surface processes, play a crucial role in generating defect distributions. Three experimental techniques and their data analysis are described in detail: a variable-energy positron beam (VEP) called sometimes a slow positron beam, a technique called implantation profile depth scanning (DSIP), and a sequential etching (SET) technique. The usability of these techniques is illustrated by many examples of measurements by the author and others.
001480905 588__ $$aOnline resource; title from PDF title page (SpringerLink, viewed September 18, 2023).
001480905 650_0 $$aMaterials$$xAnalysis.
001480905 650_0 $$aPositrons.$$xScattering$$0(DLC)sh 85105394
001480905 655_0 $$aElectronic books.
001480905 77608 $$iPrint version:$$aDryzek, Jerzy$$tPositron Profilometry$$dCham : Springer,c2023$$z9783031410925
001480905 830_0 $$aSpringerBriefs in materials,$$x2192-1105
001480905 852__ $$bebk
001480905 85640 $$3Springer Nature$$uhttps://univsouthin.idm.oclc.org/login?url=https://link.springer.com/10.1007/978-3-031-41093-2$$zOnline Access$$91397441.1
001480905 909CO $$ooai:library.usi.edu:1480905$$pGLOBAL_SET
001480905 980__ $$aBIB
001480905 980__ $$aEBOOK
001480905 982__ $$aEbook
001480905 983__ $$aOnline
001480905 994__ $$a92$$bISE