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000391991 020__ $$z0309575168
000391991 035__ $$a(CaPaEBR)ebr10071430
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000391991 040__ $$aCaPaEBR$$cCaPaEBR
000391991 05014 $$aTA2020$$b.P5 1995eb
000391991 08204 $$a621.044$$222
000391991 24500 $$aPlasma processing and processing science$$h[electronic resource] /$$cPanel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council.
000391991 260__ $$aWashington, D.C. :$$bNational Academy Press,$$c1995.
000391991 300__ $$ax, 35 p.
000391991 4901_ $$aNRL strategic series
000391991 500__ $$aCommittee chair:  Francis F. Chen.
000391991 500__ $$aThis work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124.
000391991 506__ $$aAccess limited to authorized users.
000391991 650_0 $$aPlasma engineering.
000391991 650_0 $$aSemiconductors$$xEtching.
000391991 650_0 $$aPlasma etching.
000391991 655_7 $$aElectronic books.$$2lcsh
000391991 7001_ $$aChen, Francis F.,$$d1929-
000391991 830_0 $$aNRL strategic series.
000391991 85280 $$bebk$$hProquest Ebook Central Academic Complete
000391991 85640 $$3ProQuest Ebook Central Academic Complete$$uhttps://univsouthin.idm.oclc.org/login?url=http://site.ebrary.com/lib/usiricelib/Doc?id=10071430$$zOnline Access
000391991 909CO $$ooai:library.usi.edu:391991$$pGLOBAL_SET
000391991 980__ $$aEBOOK
000391991 980__ $$aBIB
000391991 982__ $$aEbook
000391991 983__ $$aOnline