000414556 000__ 01590cam\a2200349\a\4500
000414556 001__ 414556
000414556 005__ 20210513144042.0
000414556 006__ m\\\\\\\\u\\\\\\\\
000414556 007__ cr\cn|||||||||
000414556 008__ 920422s1992\\\\dcua\\\\sb\\\\000\0\eng\\
000414556 010__ $$z   92060205 
000414556 020__ $$z0309046351
000414556 035__ $$a(CaPaEBR)ebr10055022
000414556 035__ $$a(OCoLC)647354688
000414556 040__ $$aCaPaEBR$$cCaPaEBR
000414556 05014 $$aTK7836$$b.N37 1992eb
000414556 08204 $$a621.381$$220
000414556 1102_ $$aNational Research Council (U.S.).$$bCommittee on Beam Technologies: Opportunities in Attaining Fully-Integrated Processing Systems.
000414556 24510 $$aBeam technologies for integrated processing$$h[electronic resource] :$$breport of the Committee on Beam Technologies: Opportunities in Attaining Fully-Integrated Processing Systems, National Materials Advisory Board, Commission on Engineering and Technical Systems, National Research Council.
000414556 260__ $$aWashington, D.C. :$$bNational Academy Press,$$c1992.
000414556 300__ $$axii, 89 p. :$$bill ;$$c28 cm.
000414556 500__ $$a"NMAB-461."
000414556 504__ $$aIncludes bibliographical references.
000414556 506__ $$aAccess limited to authorized users.
000414556 650_0 $$aMicroelectronics industry.
000414556 650_0 $$aMolecular beams$$xIndustrial applications.
000414556 650_0 $$aMicroelectronics$$xMaterials.
000414556 650_0 $$aPlasma-enhanced chemical vapor deposition$$xIndustrial applications.
000414556 655_7 $$aElectronic books.$$2lcsh
000414556 852__ $$bebk
000414556 85640 $$3ProQuest Ebook Central Academic Complete$$uhttps://univsouthin.idm.oclc.org/login?url=http://site.ebrary.com/lib/usiricelib/Doc?id=10055022$$zOnline Access
000414556 909CO $$ooai:library.usi.edu:414556$$pGLOBAL_SET
000414556 980__ $$aEBOOK
000414556 980__ $$aBIB
000414556 982__ $$aEbook
000414556 983__ $$aOnline