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000419596 010__ $$z   96070732 
000419596 020__ $$z0309055911
000419596 035__ $$a(CaPaEBR)ebr10056959
000419596 035__ $$a(OCoLC)647367525
000419596 040__ $$aCaPaEBR$$cCaPaEBR
000419596 05014 $$aTK7871.85$$b.D374 1996eb
000419596 24500 $$aDatabase needs for modeling and simulation of plasma processing$$h[electronic resource] /$$cPanel on Database Needs in Plasma Processing, Committee on Atomic, Molecular, and Optical Sciences and Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council.
000419596 260__ $$aWashington, D.C. :$$bNational Academy Press,$$c1996.
000419596 300__ $$a64 p. ;$$c28 cm.
000419596 4901_ $$aThe compass series
000419596 504__ $$aIncludes bibliographical references.
000419596 506__ $$aAccess limited to authorized users.
000419596 650_0 $$aSemiconductors$$xDesign and construction$$vCongresses.
000419596 650_0 $$aPlasma engineering$$xDatabases$$vCongresses.
000419596 650_0 $$aPlasma engineering$$xComputer simulation$$vCongresses.
000419596 655_7 $$aElectronic books.$$2lcsh
000419596 830_0 $$aCompass series (Washington, D.C.)
000419596 852__ $$bebk
000419596 85640 $$3ProQuest Ebook Central Academic Complete$$uhttps://univsouthin.idm.oclc.org/login?url=http://site.ebrary.com/lib/usiricelib/Doc?id=10056959$$zOnline Access
000419596 909CO $$ooai:library.usi.edu:419596$$pGLOBAL_SET
000419596 980__ $$aEBOOK
000419596 980__ $$aBIB
000419596 982__ $$aEbook
000419596 983__ $$aOnline