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000440747 020__ $$z9780470596975
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000440747 035__ $$a(CaPaEBR)ebr10419114
000440747 035__ $$a(OCoLC)666256266
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000440747 05014 $$aTK7872.M3$$bM3 2010eb
000440747 08204 $$a621.381531$$222
000440747 1001_ $$aMa, Xu,$$d1983-
000440747 24510 $$aComputational lithography$$h[electronic resource] /$$cXu Ma and Gonzalo R. Arce.
000440747 260__ $$aOxford :$$bWiley-Blackwell,$$c2010.
000440747 300__ $$a1 online resource (xv, 226 p.) :$$bill.
000440747 4901_ $$aWiley series in pure and applied optics
000440747 504__ $$aIncludes bibliographical references and index.
000440747 506__ $$aAccess limited to authorized users.
000440747 650_0 $$aMicrolithography$$xMathematics.
000440747 650_0 $$aIntegrated circuits$$xDesign and construction$$xMathematics.
000440747 650_0 $$aPhotolithography$$xMathematics.
000440747 650_0 $$aSemiconductors$$xEtching$$xMathematics.
000440747 650_0 $$aResolution (Optics)
000440747 7001_ $$aArce, Gonzalo R.
000440747 830_0 $$aWiley series in pure and applied optics.
000440747 85280 $$bebk$$hProquest Ebook Central Academic Complete
000440747 85640 $$3ProQuest Ebook Central Academic Complete$$uhttps://univsouthin.idm.oclc.org/login?url=http://site.ebrary.com/lib/usiricelib/Doc?id=10419114$$zOnline Access
000440747 909CO $$ooai:library.usi.edu:440747$$pGLOBAL_SET
000440747 980__ $$aEBOOK
000440747 980__ $$aBIB
000440747 982__ $$aEbook
000440747 983__ $$aOnline