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Table of Contents
pt. 1. Scaling and challenging of Si-based CMOS
pt. 2. High-k deposition and materials characterization
pt. 3. Challenge in interface engineering and electrode
pt. 4. Development in non-Si-based CMOS technology
pt. 5. High-k Application in novel devices
pt. 6. Challenge and directions.
pt. 2. High-k deposition and materials characterization
pt. 3. Challenge in interface engineering and electrode
pt. 4. Development in non-Si-based CMOS technology
pt. 5. High-k Application in novel devices
pt. 6. Challenge and directions.