TY  - GEN
AB  - This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes.
AU  - Nojiri, Kazuo,
CN  - TA2020
ID  - 724005
KW  - Plasma etching.
KW  - Semiconductors
LK  - https://univsouthin.idm.oclc.org/login?url=http://link.springer.com/10.1007/978-3-319-10295-5
N1  - "Based on translation from the Japanese language edition: Hajimete no handotai dry etching gijutsu by Kazuo Nojiri."
N2  - This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes.
SN  - 9783319102955
SN  - 3319102958
T1  - Dry etching technology for semiconductors
TI  - Dry etching technology for semiconductors
UR  - https://univsouthin.idm.oclc.org/login?url=http://link.springer.com/10.1007/978-3-319-10295-5
ER  -