000724005 000__ 02338cam\a2200445Ii\4500
000724005 001__ 724005
000724005 005__ 20230306140412.0
000724005 006__ m\\\\\o\\d\\\\\\\\
000724005 007__ cr\cn\nnnunnun
000724005 008__ 141105t20142015sz\a\\\\ob\\\\000\0\eng\d
000724005 019__ $$a908083111
000724005 020__ $$a9783319102955$$qelectronic book
000724005 020__ $$a3319102958$$qelectronic book
000724005 020__ $$z9783319102948
000724005 035__ $$aSP(OCoLC)ocn894509026
000724005 035__ $$aSP(OCoLC)894509026$$z(OCoLC)908083111
000724005 040__ $$aN$T$$beng$$erda$$epn$$cN$T$$dGW5XE$$dN$T$$dOCLCF$$dIDEBK$$dEBLCP
000724005 049__ $$aISEA
000724005 050_4 $$aTA2020
000724005 08204 $$a621.044$$223
000724005 1001_ $$aNojiri, Kazuo,$$eauthor.
000724005 24510 $$aDry etching technology for semiconductors$$h[electronic resource] /$$cKazuo Nojiri.
000724005 264_1 $$aCham :$$bSpringer,$$c[2014]
000724005 264_4 $$c©2015
000724005 300__ $$a1 online resource (xiii, 116 pages) :$$billustrations
000724005 336__ $$atext$$btxt$$2rdacontent
000724005 337__ $$acomputer$$bc$$2rdamedia
000724005 338__ $$aonline resource$$bcr$$2rdacarrier
000724005 500__ $$a"Based on translation from the Japanese language edition: Hajimete no handotai dry etching gijutsu by Kazuo Nojiri."
000724005 504__ $$aIncludes bibliographical references.
000724005 506__ $$aAccess limited to authorized users.
000724005 520__ $$aThis book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes.
000724005 588__ $$aOnline resource; title from PDF title page (SpringerLink, viewed November 10, 2014).
000724005 650_0 $$aPlasma etching.
000724005 650_0 $$aSemiconductors$$xEtching.
000724005 77608 $$iPrint version:$$aNojiri, Kazuo.$$tHajimete No Handotai Dry Etching Gijutsu.$$dCham : Springer International Publishing, ©2014$$z9783319102948
000724005 852__ $$bebk
000724005 85640 $$3SpringerLink$$uhttps://univsouthin.idm.oclc.org/login?url=http://link.springer.com/10.1007/978-3-319-10295-5$$zOnline Access$$91397441.1
000724005 909CO $$ooai:library.usi.edu:724005$$pGLOBAL_SET
000724005 980__ $$aEBOOK
000724005 980__ $$aBIB
000724005 982__ $$aEbook
000724005 983__ $$aOnline
000724005 994__ $$a92$$bISE