Design for manufacturability with advanced lithography [electronic resource] / Bei Yu and David Z. Pan.
2016
TK7874
Linked e-resources
Linked Resource
Online Access
Concurrent users
Unlimited
Authorized users
Authorized users
Document Delivery Supplied
Can lend chapters, not whole ebooks
Details
Title
Design for manufacturability with advanced lithography [electronic resource] / Bei Yu and David Z. Pan.
Author
Yu, Bei, author.
ISBN
9783319203850 (electronic book)
3319203851 (electronic book)
9783319203843
3319203843
3319203851 (electronic book)
9783319203843
3319203843
Published
Cham : Springer, 2016.
Language
English
Description
1 online resource.
Item Number
10.1007/978-3-319-20385-0 doi
Call Number
TK7874
Dewey Decimal Classification
621.3815
Summary
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.
Bibliography, etc. Note
Includes bibliographical references and index.
Access Note
Access limited to authorized users.
Source of Description
Online resource; title from PDF title page (viewed November 2, 2015).
Added Author
Pan, David Z., author.
Available in Other Form
Print version: 3319203843
Linked Resources
Online Access
Record Appears in
Online Resources > Ebooks
All Resources
All Resources
Table of Contents
Introduction
Layout Decomposition for Triple Patterning
Layout Decomposition for Other Patterning Techniques
Standard Cell Compliance and Placement Co-Optimization
Design for Manufacturability with E-Beam Lithography
Conclusions and Future Works.-.
Layout Decomposition for Triple Patterning
Layout Decomposition for Other Patterning Techniques
Standard Cell Compliance and Placement Co-Optimization
Design for Manufacturability with E-Beam Lithography
Conclusions and Future Works.-.