Design for manufacturability with advanced lithography [electronic resource] / Bei Yu and David Z. Pan.

Unlimited

Authorized users

Can lend chapters, not whole ebooks

Design for manufacturability with advanced lithography [electronic resource] / Bei Yu and David Z. Pan.

9783319203850 (electronic book)
3319203851 (electronic book)
9783319203843
3319203843

Cham : Springer, 2016.

English

1 online resource.

10.1007/978-3-319-20385-0 doi

TK7874

621.3815

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.

Includes bibliographical references and index.

Access limited to authorized users.

Online resource; title from PDF title page (viewed November 2, 2015).

Print version: 3319203843

Online Resources > Ebooks
All Resources