000826133 000__ 03220cam\a2200457Mi\4500
000826133 001__ 826133
000826133 005__ 20230306144346.0
000826133 006__ m\\\\\o\\d\\\\\\\\
000826133 007__ cr\un\nnnunnun
000826133 008__ 180203s2017\\\\sz\\\\\\ob\\\\001\0\eng\d
000826133 019__ $$a1008986742$$a1013506846
000826133 020__ $$a9783319678702
000826133 020__ $$a3319678701
000826133 020__ $$z9783319678696
000826133 020__ $$z3319678698
000826133 0247_ $$a10.1007/978-3-319-67870-2$$2doi
000826133 035__ $$aSP(OCoLC)on1021804337
000826133 035__ $$aSP(OCoLC)1021804337$$z(OCoLC)1008986742$$z(OCoLC)1013506846
000826133 040__ $$aEBLCP$$beng$$epn$$cEBLCP$$dYDX$$dGW5XE$$dN$T$$dCOO$$dUAB$$dMERER$$dAZU$$dOCLCF$$dOCLCQ$$dOCL
000826133 049__ $$aISEA
000826133 050_4 $$aTA1-2040
000826133 08204 $$a620
000826133 1001_ $$aFreeman, Yuri.
000826133 24510 $$aTantalum and Niobium-Based Capacitors :$$bScience, Technology, and Applications.
000826133 260__ $$aCham :$$bSpringer International Publishing,$$c2017.
000826133 300__ $$a1 online resource (133 pages)
000826133 336__ $$atext$$btxt$$2rdacontent
000826133 337__ $$acomputer$$bc$$2rdamedia
000826133 338__ $$aonline resource$$bcr$$2rdacarrier
000826133 347__ $$atext file$$bPDF$$2rda
000826133 504__ $$aIncludes bibliographical references and index.
000826133 506__ $$aAccess limited to authorized users.
000826133 520__ $$aThis book provides a comprehensive analysis of the science, technology, and applications of Tantalum and Niobium-based capacitors. The author discusses fundamentals, focusing on thermodynamic stability, major degradation processes and conduction mechanisms in the basic structure of Me-Me2O5-cathode (Me: Ta, Nb). Technology-related coverage includes chapters technology chapters on the major manufacturing steps from capacitor grade powder to the testing of finished capacitors. Applications discussed include high reliability, high charge and energy efficiency, high working voltages, high temperatures, etc. The links between the scientific foundation, breakthrough technologies and outstanding performance and reliability of the capacitors are demonstrated. The theoretical models discussed include the thermodynamics of the amorphous dielectrics, conduction mechanisms in metal-insulator-semiconductor (MIS) structures, band diagrams of the organic semiconductors, etc. Provides a single-source reference to the science, technology, and applications of Tantalum and Niobium-based capacitors; Focuses on Polymer Tantalum capacitors, with rapidly growing applications in special and commercial electronics; Discusses in detail conduction and degradation mechanisms in amorphous dielectrics and multilayer capacitor structures with amorphous dielectrics, such as metal-insulator-semiconductor (MIS) structures with inorganic and organic semiconductors, as well as MOSFET transistors with high k dielectrics.
000826133 588__ $$aDescription based on print version record.
000826133 650_0 $$aCapacitors.
000826133 650_0 $$aCapacitors$$xMaterials.
000826133 77608 $$iPrint version:$$aFreeman, Yuri.$$tTantalum and Niobium-Based Capacitors : Science, Technology, and Applications.$$dCham : Springer International Publishing, ©2017$$z9783319678696
000826133 852__ $$bebk
000826133 85640 $$3SpringerLink$$uhttps://univsouthin.idm.oclc.org/login?url=http://link.springer.com/10.1007/978-3-319-67870-2$$zOnline Access$$91397441.1
000826133 909CO $$ooai:library.usi.edu:826133$$pGLOBAL_SET
000826133 980__ $$aEBOOK
000826133 980__ $$aBIB
000826133 982__ $$aEbook
000826133 983__ $$aOnline
000826133 994__ $$a92$$bISE