TY  - GEN
N2  - This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
DO  - 10.1007/978-3-319-76294-4
DO  - doi
AB  - This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
T1  - Physical design and mask synthesis for directed self-assembly lithography /
AU  - Shim, Seongbo,
AU  - Shin, Youngsoo,
CN  - TK7874
ID  - 827160
KW  - Integrated circuits
KW  - Integrated circuits
KW  - Self-assembly (Chemistry)
KW  - Lithography.
SN  - 9783319762944
SN  - 331976294X
TI  - Physical design and mask synthesis for directed self-assembly lithography /
LK  - https://univsouthin.idm.oclc.org/login?url=http://link.springer.com/10.1007/978-3-319-76294-4
UR  - https://univsouthin.idm.oclc.org/login?url=http://link.springer.com/10.1007/978-3-319-76294-4
ER  -