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Intro; Dedication to Xin Jiang; Preface; About This Book; Contents; Contributors; 1 Homoepitaxial Diamond Growth by Plasma-Enhanced Chemical Vapor Deposition; Abstract; 1.1 Introduction; 1.2 Growth Mechanism; 1.2.1 Hydrogen; 1.2.2 Carbon; 1.3 Growth Modes; 1.4 Doping; 1.5 Growth of Atomically Flat Diamond; 1.5.1 Hillock-Free Surfaces; 1.5.2 Step/Terrace Structures; 1.5.3 Atomically Step-Free Surfaces; 1.6 Conclusions; Acknowledgements; References; 2 The Effect of Dopants on Diamond Surface Properties and Growth; Abstract; 2.1 Introduction; 2.2 Methods and Methodologies; 2.3 General
2.3.1 Diamond Doping Using Nitrogen, Phosphorous, Sulphur or Boron2.3.1.1 N-type Doping Using Nitrogen; 2.3.1.2 N-type Doping Using Phosphorous or Sulphur; 2.3.1.3 P-Type Doping Using Boron; 2.3.2 Growth Mechanism; 2.3.3 H Abstraction Rates for Growth of Non-doped Diamond; 2.4 Nitrogen-Induced Effect on Diamond Growth; 2.4.1 Introduction; 2.4.2 N Substitutionally Positioned into Various C Atomic Layers; 2.4.3 N Substitutionally Positioned Within the C Atomic Layer 2; 2.4.4 N Chemisorbed onto the Surface in the Form NH or NH2; 2.5 Phosphorous- or Sulfur-Induced Effect on Diamond Growth
2.5.1 Introduction2.5.2 Thermodynamics-H Abstraction Energies; 2.5.3 Kinetics-H Abstraction Barriers; 2.6 Boron-Induced Effect on Diamond Growth; 2.6.1 Introduction; 2.6.2 Thermodynamics-H Abstraction Energies; 2.6.3 Kinetics-H Abstraction Barriers; 2.7 Summary; Acknowledgements; References; 3 Chemical Mechanical Polishing of Nanocrystalline Diamond; Abstract; 3.1 Introduction; 3.2 Method for Chemical Mechanical Polishing of Diamond; 3.3 Chemical Mechanical Polishing of Diamond; 3.3.1 Polishing of Nanocrystalline Diamond Films; 3.3.2 Polishing of Single Crystal Diamond
3.3.3 Polishing with Ceria and Alumina3.3.4 Abrasive Particle Size Dependence of Polishing; 3.3.5 Effect of Redox Agents on the CMP of NCD Films; 3.3.6 Possible Mechanism for Polishing; 3.4 CMP of Superconducting NCD Thin Films; 3.5 Conclusion; Acknowledgements; References; 4 Single Crystal Diamond Micromechanical and Nanomechanical Resonators; Abstract; 4.1 Introduction; 4.1.1 Background of MEMS; 4.1.2 Diamond for MEMS/NEMS; 4.2 Fabrication of Single Crystal Diamond Mechanical Resonators; 4.3 Structure of SCD Mechanical Resonators Fabricated by IAL Method
4.4 Nanoindentation of SCD Resonators4.5 Mechanical Resonance Properties of SCD Mechanical Resonators; 4.5.1 Resonance Frequency of the SCD Mechanical Resonators; 4.5.2 Energy Dissipation in SCD Cantilevers and Quality Factor; 4.5.3 Strategies Toward High Quality-Factors; 4.6 Summary and Outlook; Acknowledgements; References; 5 Nitrogen Incorporated (Ultra)Nanocrystalline Diamond Films for Field Electron Emission Applications; Abstract; 5.1 Introduction; 5.2 Nitrogen in Diamond; 5.3 Nitrogen Ion Implanted UNCD Films; 5.4 In situ Doping Using N2 in a CH4/H2 Plasma
2.3.1 Diamond Doping Using Nitrogen, Phosphorous, Sulphur or Boron2.3.1.1 N-type Doping Using Nitrogen; 2.3.1.2 N-type Doping Using Phosphorous or Sulphur; 2.3.1.3 P-Type Doping Using Boron; 2.3.2 Growth Mechanism; 2.3.3 H Abstraction Rates for Growth of Non-doped Diamond; 2.4 Nitrogen-Induced Effect on Diamond Growth; 2.4.1 Introduction; 2.4.2 N Substitutionally Positioned into Various C Atomic Layers; 2.4.3 N Substitutionally Positioned Within the C Atomic Layer 2; 2.4.4 N Chemisorbed onto the Surface in the Form NH or NH2; 2.5 Phosphorous- or Sulfur-Induced Effect on Diamond Growth
2.5.1 Introduction2.5.2 Thermodynamics-H Abstraction Energies; 2.5.3 Kinetics-H Abstraction Barriers; 2.6 Boron-Induced Effect on Diamond Growth; 2.6.1 Introduction; 2.6.2 Thermodynamics-H Abstraction Energies; 2.6.3 Kinetics-H Abstraction Barriers; 2.7 Summary; Acknowledgements; References; 3 Chemical Mechanical Polishing of Nanocrystalline Diamond; Abstract; 3.1 Introduction; 3.2 Method for Chemical Mechanical Polishing of Diamond; 3.3 Chemical Mechanical Polishing of Diamond; 3.3.1 Polishing of Nanocrystalline Diamond Films; 3.3.2 Polishing of Single Crystal Diamond
3.3.3 Polishing with Ceria and Alumina3.3.4 Abrasive Particle Size Dependence of Polishing; 3.3.5 Effect of Redox Agents on the CMP of NCD Films; 3.3.6 Possible Mechanism for Polishing; 3.4 CMP of Superconducting NCD Thin Films; 3.5 Conclusion; Acknowledgements; References; 4 Single Crystal Diamond Micromechanical and Nanomechanical Resonators; Abstract; 4.1 Introduction; 4.1.1 Background of MEMS; 4.1.2 Diamond for MEMS/NEMS; 4.2 Fabrication of Single Crystal Diamond Mechanical Resonators; 4.3 Structure of SCD Mechanical Resonators Fabricated by IAL Method
4.4 Nanoindentation of SCD Resonators4.5 Mechanical Resonance Properties of SCD Mechanical Resonators; 4.5.1 Resonance Frequency of the SCD Mechanical Resonators; 4.5.2 Energy Dissipation in SCD Cantilevers and Quality Factor; 4.5.3 Strategies Toward High Quality-Factors; 4.6 Summary and Outlook; Acknowledgements; References; 5 Nitrogen Incorporated (Ultra)Nanocrystalline Diamond Films for Field Electron Emission Applications; Abstract; 5.1 Introduction; 5.2 Nitrogen in Diamond; 5.3 Nitrogen Ion Implanted UNCD Films; 5.4 In situ Doping Using N2 in a CH4/H2 Plasma