Electrical atomic force microscopy for nanoelectronics / Umberto Celano, editor.
Celano, Umberto, editor.
2019
QH212.A78
Available Online

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Title Electrical atomic force microscopy for nanoelectronics / Umberto Celano, editor.
ISBN 9783030156121 (electronic book)
3030156125 (electronic book)
3030156117
9783030156114
DOI https://doi.org/10.1007/978-3-030-15
Published Cham, Switzerland : Springer, [2019]
Language English
Description 1 online resource
Item Number 10.1007/978-3-030-15
Call Number QH212.A78
Dewey Decimal Classification 502.81
Summary The tremendous impact of electronic devices on our lives is the result of continuous improvements of the billions of nanoelectronic components inside integrated circuits (ICs). However, ultra-scaled semiconductor devices require nanometer control of the many parameters essential for their fabrication. Through the years, this created a strong alliance between microscopy techniques and IC manufacturing. This book reviews the latest progress in IC devices, with emphasis on the impact of electrical atomic force microscopy (AFM) techniques for their development. The operation principles of many techniques are introduced, and the associated metrology challenges described. Blending the expertise of industrial specialists and academic researchers, the chapters are dedicated to various AFM methods and their impact on the development of emerging nanoelectronic devices. The goal is to introduce the major electrical AFM methods, following the journey that has seen our lives changed by the advent of ubiquitous nanoelectronics devices, and has extended our capability to sense matter on a scale previously inaccessible.
Bibliography, etc. Note Includes bibliographical references.
Access Note Access limited to authorized users.
Source of Description Online resource; title from PDF title page (SpringerLink, viewed August 29, 2019).
Added Author Celano, Umberto, editor.
Series Nanoscience and technology.
Available in Other Form Print version: 9783030156114
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Introduction (U. Celano, W. Vandervorst)
Conductive AFM for nanoscale analysis of high-k dielectric metal oxides (C. Rodenbücher, M. Wojtyniak, K. Szot)
Mapping Conductance and Carrier Distribution in Confined Three-Dimensional Transistor Structures (A. Schulze, P. Eyben, K. Paredis, L. Wouters, U. Celano, W. Vandervorst)
Scanning Capacitance Microscopy for two-dimensional carrier profiling of semiconductor devices (J. Mody, J. Nxumalo)
Scanning probe lithography for nanopatterning and fabrication of high-resolution devices (Y. K. Ryu, A. W. Knoll)
Characterizing Ferroelectricity with an Atomic Force Microscopy: an all-around technique (S. Martin, B. Gautier, N. Baboux, A. Gruvermann, A. Carretero-Genevrier, M. Gich, A. Gomez)
Electrical AFM for the analysis of Resistive Switching (S. Brivio, J. Frascaroli, M. H. Lee)
Magnetic force microscopy for magnetic recording and devices (A. Hirohata, M. Samiepour, M. Corbetta)
Nanoscale space charge density profiling with KPFM and photoconductive C-AFM/KPFM (C. Villeneuve-Faure, K. Makasheva, L. Boudou, G. Teyssedre)
Electrical AFM of 2D materials and heterostructures for nanoelectronics (F. Giannazzo, G. Greco, F. Roccaforte, C. Mahata, M. Lanza)
Diamond probes technology (T. Hantschel, T. Conard, J. Kilpatrick, G. Cross)
Scanning Microwave Impedance Microscopy (sMIM) in electronic materials and quantum materials (K. Rubin, Y. Yang, O. Amster, D. Scrymgeour, S. Misra).

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