Investigation on SiGe selective epitaxy for source and drain engineering in 22 nm CMOS technology node and beyond / Guilei Wang.
2020
QD921
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Title
Investigation on SiGe selective epitaxy for source and drain engineering in 22 nm CMOS technology node and beyond / Guilei Wang.
Author
ISBN
9789811500466 (electronic book)
9811500460 (electronic book)
9789811500459
9811500452
9811500460 (electronic book)
9789811500459
9811500452
Publication Details
Singapore : Springer, 2020.
Language
English
Description
1 online resource
Call Number
QD921
Dewey Decimal Classification
548/.5
Note
"Doctoral thesis accepted by Chinese Academy of Sciences, Beijing, China."
Bibliography, etc. Note
Includes bibliographical references.
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Access limited to authorized users.
Series
Springer theses.
Available in Other Form
Print version: 9789811500459
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