000915989 000__ 03165cam\a2200481Ii\4500 000915989 001__ 915989 000915989 005__ 20230306150517.0 000915989 006__ m\\\\\o\\d\\\\\\\\ 000915989 007__ cr\cn\nnnunnun 000915989 008__ 191023s2019\\\\sz\a\\\\o\\\\\000\0\eng\d 000915989 019__ $$a1125107093$$a1125992686 000915989 020__ $$a9783030284374$$q(electronic book) 000915989 020__ $$a3030284379$$q(electronic book) 000915989 020__ $$z9783030284367 000915989 0247_ $$a10.1007/978-3-030-28437-4$$2doi 000915989 0247_ $$a10.1007/978-3-030-28 000915989 035__ $$aSP(OCoLC)on1124856002 000915989 035__ $$aSP(OCoLC)1124856002$$z(OCoLC)1125107093$$z(OCoLC)1125992686 000915989 040__ $$aGW5XE$$beng$$erda$$epn$$cGW5XE$$dEBLCP$$dLQU$$dOCLCF$$dUKMGB 000915989 0411_ $$aeng$$hrus 000915989 049__ $$aISEA 000915989 050_4 $$aQC702.7.N4 000915989 08204 $$a541/.372$$223 000915989 1001_ $$aDudnikov, Vadim,$$eauthor. 000915989 24510 $$aDevelopment and applications of negative ion sources /$$cVadim Dudnikov. 000915989 264_1 $$aCham, Switzerland :$$bSpringer,$$c2019. 000915989 300__ $$a1 online resource (xiv, 346 pages) :$$billustrations. 000915989 336__ $$atext$$btxt$$2rdacontent 000915989 337__ $$acomputer$$bc$$2rdamedia 000915989 338__ $$aonline resource$$bcr$$2rdacarrier 000915989 4901_ $$aSpringer series on atomic, optical, and plasma physics,$$x1615-5653 ;$$vvolume 110 000915989 504__ $$aIncludes bibliographical references and index. 000915989 5050_ $$aChapter1: Introduction -- Chapter2: Charge exchange Technologies Control of Flow of accelerated particles -- Chapter3: Methods of negative ion beam production -- Chapter4: Surface Plasma Method for negative ion beam production -- Chapter5: Surface Plasma negative ion Sources -- Chapter6: Transportation of high brightness negative ion beams, space charge compensation, Instability -- Chapter7: General Remarks on the Surface Plasma Method of negative ion beams production -- Bibliography. 000915989 506__ $$aAccess limited to authorized users. 000915989 520__ $$aThis book covers the development of sources of negative ions and their application in science and industry. It describes the physical foundations and implementation of the key methods of negative ion production and control, such as charge exchange, thermionic emission, secondary emission (sputtering) and surface-plasma sources, as well as the history of their development. Following on from this essential foundational material, the book goes on to explore transport of negative ion beams, and beam-plasma instabilities. With exposition accessible at the graduate level, and a comprehensive bibliography, this book will appeal to all students and researchers whose work concerns ion sources and their applications to accelerators, beam physics, storage rings, cyclotrons, and plasma traps. 000915989 588__ $$aOnline resource; title from PDF title page (SpringerLink, viewed October 23, 2019). 000915989 650_0 $$aAnions. 000915989 77608 $$iPrint version:$$aDudnikov, Vadim$$tDevelopment and Applications of Negative Ion Sources$$dCham : Springer,c2019$$z9783030284367 000915989 830_0 $$aSpringer series on atomic, optical, and plasma physics ;$$v110. 000915989 852__ $$bebk 000915989 85640 $$3SpringerLink$$uhttps://univsouthin.idm.oclc.org/login?url=http://link.springer.com/10.1007/978-3-030-28437-4$$zOnline Access$$91397441.1 000915989 909CO $$ooai:library.usi.edu:915989$$pGLOBAL_SET 000915989 980__ $$aEBOOK 000915989 980__ $$aBIB 000915989 982__ $$aEbook 000915989 983__ $$aOnline 000915989 994__ $$a92$$bISE