TY  - GEN
AU  - Park, Byung-Eun.
AU  - Ishiwara, Hiroshi,
AU  - Okuyama, Masanori,
AU  - Sakai, Shigeki.
AU  - Yoon, Sung-Min.
CN  - TK7871.95
CY  - Singapore :
DA  - 2020.
ET  - 2nd ed.
ID  - 930449
KW  - Field-effect transistors.
KW  - Ferroelectric thin films.
LK  - https://univsouthin.idm.oclc.org/login?url=http://link.springer.com/10.1007/978-981-15-1212-4
PB  - Springer,
PP  - Singapore :
PY  - 2020.
SN  - 9789811512124
SN  - 9811512124
T1  - Ferroelectric-gate field effect transistor memories :device physics and applications /
TI  - Ferroelectric-gate field effect transistor memories :device physics and applications /
UR  - https://univsouthin.idm.oclc.org/login?url=http://link.springer.com/10.1007/978-981-15-1212-4
VL  - v.131
ER  -