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Table of Contents
1. Technological plasmas and typical schematics
1.1. Direct current plasma
1.2. Radio-frequency (RF) plasma
1.3. Microwave (MW) plasma
1.4. Arc plasmas
1.5. References
2. Plasma parameters with respect to material processing
2.1. References
3. How to control plasma parameters
3.1. Incorporating technological architectures
3.2. External substrate architectures
3.3. References
4. Material processing
4.1. Traditional processes : etching, deposition, and modification
4.2. Plasma for nanofabrication
4.3. References
5. Perspectives and trends
5.1. References
6. Conclusion.
1.1. Direct current plasma
1.2. Radio-frequency (RF) plasma
1.3. Microwave (MW) plasma
1.4. Arc plasmas
1.5. References
2. Plasma parameters with respect to material processing
2.1. References
3. How to control plasma parameters
3.1. Incorporating technological architectures
3.2. External substrate architectures
3.3. References
4. Material processing
4.1. Traditional processes : etching, deposition, and modification
4.2. Plasma for nanofabrication
4.3. References
5. Perspectives and trends
5.1. References
6. Conclusion.