Dielectric breakdown in gigascale electronics [electronic resource] : time dependent failure mechanisms / Juan Pablo Borja, Toh-Ming Lu, Joel Plawsky.
Borja, Juan Pablo, author.; Lu, Toh-Ming, author.; Plawsky, Joel, author.
2016
TK7874
Available Online

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Title Dielectric breakdown in gigascale electronics [electronic resource] : time dependent failure mechanisms / Juan Pablo Borja, Toh-Ming Lu, Joel Plawsky.
Author Borja, Juan Pablo, author.
ISBN 9783319432205 (electronic book)
3319432206 (electronic book)
3319432184
9783319432182
Publication Details Cham, Switzerland : Springer, 2016.
Language English
Description 1 online resource.
Call Number TK7874
Dewey Decimal Classification 621.381
Summary This book focuses on the experimental and theoretical aspects of the time-dependent breakdown of advanced dielectric films used in gigascale electronics. Coverage includes the most important failure mechanisms for thin low-k films, new and established experimental techniques, recent advances in the area of dielectric failure, and advanced simulations/models to resolve and predict dielectric breakdown, all of which are of considerable importance for engineers and scientists working on developing and integrating present and future chip architectures. The book is specifically designed to aid scientists in assessing the reliability and robustness of electronic systems employing low-k dielectric materials such as nano-porous films. Similarly, the models presented here will help to improve current methodologies for estimating the failure of gigascale electronics at device operating conditions from accelerated lab test conditions. Numerous graphs, tables, and illustrations are included to facilitate understanding of the topics. Readers will be able to understand dielectric breakdown in thin films along with the main failure modes and characterization techniques. In addition, they will gain expertise on conventional as well as new field acceleration test models for predicting long term dielectric degradation.
Bibliography, etc. Note Includes bibliographical references and index.
Access Note Access limited to authorized users.
Source of Description Online resource, title from PDF title page (viewed September 25, 2016)
Added Author Lu, Toh-Ming, author.
Plawsky, Joel, author.
Series SpringerBriefs in materials.
Available in Other Form Print version: 9783319432182
Linked Resources Online Access
Record Appears in Online Resources > Ebooks
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Introduction
General Theories
Measurement Tools and Test Structures
Experimental Techniques
Breakdown Experiments
Kinetics of Charge Carrier Confinement in Thin Dielectrics
Theory of Dielectric Breakdown in Nanoporous Thin Films
Dielectric Breakdown in Copper Interconnects
Reconsidering Conventional Models.

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